The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2010
Filed:
Apr. 27, 2007
Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas
Jennifer Y. Sun, Sunnyvale, CA (US);
Ren-guan Duan, San Jose, CA (US);
Jie Yuan, San Jose, CA (US);
LI Xu, San Jose, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Jennifer Y. Sun, Sunnyvale, CA (US);
Ren-Guan Duan, San Jose, CA (US);
Jie Yuan, San Jose, CA (US);
Li Xu, San Jose, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A ceramic article which is resistant to erosion by halogen-containing plasmas used in semiconductor processing. The ceramic article includes ceramic which is multi-phased, typically including two phase to three phases. The ceramic is formed from yttrium oxide at a molar concentration ranging from about 50 mole % to about 75 mole %; zirconium oxide at a molar concentration ranging from about 10 mole % to about 30 mole %; and at least one other component, selected from the group consisting of aluminum oxide, hafnium oxide, scandium oxide, neodymium oxide, niobium oxide, samarium oxide, ytterbium oxide, erbium oxide, cerium oxide, and combinations thereof, at a molar concentration ranging from about 10 mole % to about 30 mole %.