The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2010
Filed:
Jun. 22, 2006
Antoine Gaston Marie Kiers, Veldhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Stefan Carolus Jacobus Antonius Keij, Breda, NL;
Antoine Gaston Marie Kiers, Veldhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Stefan Carolus Jacobus Antonius Keij, Breda, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Simultaneous measurement of two orthogonally polarized beams upon diffraction from a substrate is done to determine properties of the substrate. Linearly polarized light sources with their radiation polarized in orthogonal directions are passed via two non-polarizing beamsplitters, one rotated by 90° with respect to the other. The combined beam is then diffracted off a substrate before being passed back through a non-polarizing beamsplitter and through a phase shifter and a Wollaston prism before being measured by a CCD camera. In this way, the phase and intensities for various phase steps of the two polarized beams may thereby be measured and the polarization state of the beams may be determined. If the phase shifter is turned to zero (i.e. with no phase shifting), the grating of the substrate has its parameters measured with TE and TM polarized light simultaneously with the same detector system.