The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2010
Filed:
Sep. 22, 2004
Yuji Yoshimura, Onoda, JP;
Masami Yasukawa, Sodegaura, JP;
Syuji Morikiyo, Onoda, JP;
Yasutaka Takada, Funabashi, JP;
Hiroo Matsumoto, Funabashi, JP;
Yuji Yoshimura, Onoda, JP;
Masami Yasukawa, Sodegaura, JP;
Syuji Morikiyo, Onoda, JP;
Yasutaka Takada, Funabashi, JP;
Hiroo Matsumoto, Funabashi, JP;
Nissan Chemical Industries, Ltd., Tokyo, JP;
Abstract
A process for producing a high purity 3,5-dihydroxy6-heptenoic acid derivative by controlling the content of impurities such as denatured substances, is provided. When a 3,5-dihydroxy-6-heptenoic acid derivative is produced by a process which comprises a step of contacting the 3,5-dihydroxy-6-heptenoic acid derivative of the formula (1) wherein R is a Calkyl group, with a Clower alcohol-containing solvent, an alcohol containing solvent having its content of an oxidizing substance lowered, is used to at most 0.05 molar equivalent to a 3,5-dihydroxy-6-heptenoic acid derivative, to suppress impurities contained in the 3,5-dihydroxy-6heptenoic acid derivative.