The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2010
Filed:
Oct. 20, 2008
Applicants:
Laurent Grenouillet, Rives, FR;
Jonathan Garcia, Monestier du Percy, FR;
François Marion, Saint Martin le Vinoux, FR;
Nicolas Olivier, Teche, FR;
Marion Perrin, Valence, FR;
Inventors:
Laurent Grenouillet, Rives, FR;
Jonathan Garcia, Monestier du Percy, FR;
François Marion, Saint Martin le Vinoux, FR;
Nicolas Olivier, Teche, FR;
Marion Perrin, Valence, FR;
Assignee:
Commissariat a l'Energie Atomique, Paris, FR;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention relates to a method for manufacturing chips composed of at least one electrically conductive material. Such a method comprises the following steps:
Grenouillet, Laurent. (2010). Method for manufacturing metal chips by plasma from a layer comprising several elements (U.S. Patent No. 7691735). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7691735
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile