The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2010
Filed:
Jul. 19, 2006
Toshimitsu Hirai, Chino, JP;
Katsuyuki Moriya, Azumino, JP;
Toshimitsu Hirai, Chino, JP;
Katsuyuki Moriya, Azumino, JP;
Seiko Epson Corporation, , JP;
Abstract
A method for forming a film pattern, comprises: disposing a first bank forming material to a substrate so as to form a first bank layer; disposing a second bank forming material on the first bank layer so as to form a second bank layer; and pattering the first bank layer and the second bank layer so as to form a bank including a pattern forming region having a first pattern forming region and a second pattern forming region, the second pattern forming region having a width larger than a width of the first pattern forming region, and being continuously formed from the first pattern forming region, wherein the first bank layer has a sidewall facing the pattern forming region and a first contact angle of less than 50 degrees with respect to a functional liquid containing HO on the sidewall, and the second bank layer has a second contact angle larger than the first contact angle with respect to the functional liquid.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile