The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2010
Filed:
Jul. 16, 2007
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
Wouter Anthon Soer, Nijmegen, NL;
Kurt Gielissen, Eindhoven, NL;
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
Wouter Anthon Soer, Nijmegen, NL;
Kurt Gielissen, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A debris prevention system is constructed and arranged to prevent debris that emanates from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes an aperture that defines a maximum emission angle of the radiation coming from the radiation source, and a first debris barrier having a radiation transmittance. The first debris barrier includes a rotatable foil trap. The debris prevention system also includes a second debris barrier that has a radiation transmittance. The first debris barrier is configured to cover a part of the emission angle and the second debris barrier is configured to cover another part of the emission angle.