The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2010
Filed:
Sep. 13, 2006
Khiem K. Nguyen, San Jose, CA (US);
Peter Satitpunwaycha, Sunnyvale, CA (US);
Alfred W. Mak, Union City, CA (US);
Khiem K. Nguyen, San Jose, CA (US);
Peter Satitpunwaycha, Sunnyvale, CA (US);
Alfred W. Mak, Union City, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A photomask etch chamber, which includes a substrate support member disposed inside the chamber. The substrate support member is configured to support a photomask substrate. The chamber further includes a ceiling disposed on the chamber and an endpoint detection system configured to detect a peripheral region of the photomask substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile