The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2010
Filed:
Nov. 18, 2004
Ho-man Rodney Chiu, San Jose, CA (US);
Daniel O. Clark, Pleasanton, CA (US);
Shaun W. Crawford, San Ramon, CA (US);
Jay J. Jung, Sunnyvale, CA (US);
Youssef A. Loldj, Sunnyvale, CA (US);
Robbert Vermeulen, Pleasant Hill, CA (US);
Ho-Man Rodney Chiu, San Jose, CA (US);
Daniel O. Clark, Pleasanton, CA (US);
Shaun W. Crawford, San Ramon, CA (US);
Jay J. Jung, Sunnyvale, CA (US);
Youssef A. Loldj, Sunnyvale, CA (US);
Robbert Vermeulen, Pleasant Hill, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The present invention relates to a thermal reactor apparatus used to treat industrial effluent fluids, for example waste effluent produced in semiconductor and liquid crystal display manufacturing processes. Specifically, the present invention relates to improved monitoring and control features for the thermal reactor apparatus, including a flame sensing device, an intrinsically safe flammable gas sensing device, and a sequential mode of operation having built-in safety redundancy. The improved monitoring and control features ensure the safe and efficient abatement of waste effluent within the thermal reactor apparatus.