The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7681521 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 23, 2010

Filed:

Nov. 07, 2003
Applicant:

Takahiro Nishibayashi, Kumamoto, JP;

Inventor:

Takahiro Nishibayashi, Kumamoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); B05C 11/00 (2006.01); B05B 13/00 (2006.01); B05B 13/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

An SOD system (A) comprises a process block () for performing a prescribed processing so as to form an insulating film on a wafer W, a carrier block () for transferring the wafer W from the outside into the process block (), a sub-transfer mechanism () for transferring the substrate W between the process block () and the carrier block (), and a main transfer mechanism (). A process tower (T) prepared by stacking one upon the other a plurality of process units for performing a series of processing for forming an insulating film on the wafer W is arranged detachable from the process block ().


Find Patent Forward Citations

Nishibayashi, Takahiro. (2010). Insulation film formation device (U.S. Patent No. 7681521). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7681521

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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