The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2010
Filed:
Feb. 01, 2008
Michel Pieter Dansberg, Eindhoven, NL;
Sebastiaan Maria Johannes Cornelissen, Eindhoven, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Robert Johannes Petrus Van Diesen, Oirschot, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Robert-han Munnig-schmidt, Hapert, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Rob Jansen, Veldhoven, NL;
Michel Pieter Dansberg, Eindhoven, NL;
Sebastiaan Maria Johannes Cornelissen, Eindhoven, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Robert Johannes Petrus Van Diesen, Oirschot, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Robert-Han Munnig-Schmidt, Hapert, NL;
Harmen Klaas Van der Schoot, Vught, NL;
Rob Jansen, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.