The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 16, 2010

Filed:

May. 18, 2006
Applicants:

Oscar Khaselev, Monmounth Junction, NJ (US);

Brian G. Lewis, Branford, CT (US);

Michael Marczi, Jersey City, NJ (US);

Bawa Singh, Voorhees, NJ (US);

Inventors:

Oscar Khaselev, Monmounth Junction, NJ (US);

Brian G. Lewis, Branford, CT (US);

Michael Marczi, Jersey City, NJ (US);

Bawa Singh, Voorhees, NJ (US);

Assignee:

Fry's Metals, Inc., Jersey City, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 13/12 (2006.01); G03G 13/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

A mask for application to a substrate to facilitate electrokinetic deposition of charged particles onto the substrate, the mask comprising a conducting layer, a dielectric layer, and mask openings. A method for applying a pattern of charged particles to a substrate comprising applying the foregoing the substrate to yield a masked substrate; immersing the masked substrate in a bath containing the charged particles; and establishing an electrical potential between the conducting layer of the mask and a counter-electrode thereby electrokinetically depositing the particles through the mask openings onto areas of the substrate exposed in the mask openings. Products made by this method.


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