The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2010
Filed:
Feb. 04, 2008
Chia-ho Liu, Hsinchu, TW;
Chieh-yu Tsai, Taipei, TW;
Wei-chen Lin, Taipei County, TW;
Chia-ying Lin, Taitung County, TW;
Chia-Ho Liu, Hsinchu, TW;
Chieh-Yu Tsai, Taipei, TW;
Wei-Chen Lin, Taipei County, TW;
Chia-Ying Lin, Taitung County, TW;
United Microelectronics Corp., Hsin-Chu, TW;
Abstract
A method for forming spacers of different sizes includes the following steps. First a substrate is provided, which has a first element, a second element, a first material layer and a second material layer thereon. A first dry etching is performed to remove part of the second material layer to form a first spacer by the first element and to form a second side wall by the second element, so that the first material layer between the first spacer and the second side wall is exposed to become a damaged first material layer. A trimming procedure is performed to trim the damaged first material layer. A mask is used to cover the first element, the first spacer and part of the first material layer then a wet etching is performed to remove the second side wall.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile