The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 09, 2010

Filed:

Jan. 23, 2009
Applicant:

Shih-lian Cheng, Hsinchu, TW;

Inventor:

Shih-Lian Cheng, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/8234 (2006.01); H01L 21/8244 (2006.01); H01L 21/20 (2006.01); H01L 21/44 (2006.01);
U.S. Cl.
CPC ...
Abstract

A fabricating process for a substrate with an embedded passive component is provided. The fabricating process includes the following steps. First, a substrate including a top conductive layer, a bottom conductive layer, and at least a dielectric layer is provided. The top conductive layer and the bottom conductive layer are separately disposed on a top surface and a bottom surface of the dielectric layer. Next, a plurality of plating through holes is formed in the substrate. Then, the top and the bottom conductive layers are patterned to form a patterned top conductive layer and a patterned bottom conductive layer separately, and the dielectric layer is exposed in part. The patterned top conductive layer and the patterned bottom conductive layer have many traces and many trenches formed by the traces. Thereafter, the trenches are filled with a material, wherein the traces and the material are adapted for forming the passive component.


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