The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7674644 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 09, 2010

Filed:

Sep. 12, 2005
Applicants:

Masato Kobayakawa, Ichihara, JP;

Hisayuki Miki, Ichihara, JP;

Inventors:

Masato Kobayakawa, Ichihara, JP;

Hisayuki Miki, Ichihara, JP;

Assignee:

Showa Denko K.K., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for the fabrication of a Group III nitride semiconductor includes the steps of installing a substrate in a reaction vessel, forming a Group III nitride semiconductor on the substrate, causing a solid nitrogen compound to exist in the reaction vessel as a nitrogen source for a Group III nitride semiconductor and supplying a raw material gas as a source for a Group III element into the reaction vessel to fabricate the Group III nitride semiconductor.


Find Patent Forward Citations

Kobayakawa, Masato. (2010). Method for fabrication of group iii nitride semiconductor (U.S. Patent No. 7674644). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7674644

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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