The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 02, 2010

Filed:

Jul. 02, 2007
Applicants:

Ju-hwan Jung, Yongin-si, KR;

Jae-hong Lee, Seoul, KR;

Hyung-cheol Shin, Seoul, KR;

Jun-soo Kim, Seoul, KR;

Seung-bum Hong, Yongin-si, KR;

Inventors:

Ju-hwan Jung, Yongin-si, KR;

Jae-hong Lee, Seoul, KR;

Hyung-cheol Shin, Seoul, KR;

Jun-soo Kim, Seoul, KR;

Seung-bum Hong, Yongin-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 31/02 (2006.01); G01N 23/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor probe having an embossed resistive tip and a method of fabricating the semiconductor probe are provided. The semiconductor probe includes a protrusion portion protruded to a predetermined height on a cantilever in a first direction crossing a length direction of the cantilever, an embossed resistive tip formed on the protrusion portion, and first and second semiconductor electrode regions formed at opposite sides of the embossed resistive tip at the protrusion portion, wherein the cantilever is doped with a first dopant, the first and second semiconductor electrode regions and the embossed resistive tip are doped with a second dopant having a different polarity from the first dopant, and the embossed resistive tip is doped with a concentration lower than the first and second semiconductor electrode regions.


Find Patent Forward Citations

Loading…