The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 02, 2010

Filed:

Mar. 10, 2004
Applicants:

Kyoung-hwan Yeo, Seoul, KR;

Dong-gun Park, Gyeonggi-do, KR;

Jeong-dong Choe, Gyeonggi-do, KR;

Inventors:

Kyoung-Hwan Yeo, Seoul, KR;

Dong-Gun Park, Gyeonggi-do, KR;

Jeong-Dong Choe, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract

Unit cells of metal oxide semiconductor (MOS) transistors are provided including an integrated circuit substrate an a MOS transistor on the integrated circuit substrate. The MOS transistor includes a source region, a drain region and a gate. The gate is positioned between the source region and the drain region. A horizontal channel is provided between the source and drain regions. The horizontal channel includes at least two spaced apart horizontal channel regions. Related methods of fabricating MOS transistors are also provided.


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