The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2010
Filed:
Sep. 21, 2005
Applicants:
Yeong-jun Choi, Cedar Park, TX (US);
Byung-jin Choi, Austin, TX (US);
Inventors:
Yeong-Jun Choi, Cedar Park, TX (US);
Byung-Jin Choi, Austin, TX (US);
Assignee:
Molecular Imprints, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B28B 11/00 (2006.01); C23F 1/00 (2006.01); B41C 1/06 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention is directed towards a method of controlling an atmosphere about a substrate, the method including, inter alia, positioning a body a distance from a surface of the substrate, the body having a wall coupled thereto placed in a position to create a flow resistance of a fluid between first and second regions of the substrate; and altering the position of the wall such that when a magnitude of the distance between the body and the surface of the substrate is decreased, a probability of the wall contacting the substrate is minimized.