The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 02, 2010

Filed:

Jul. 06, 2007
Applicants:

John A. Fitzsimmons, Poughkeepsie, NY (US);

David L. Rath, Stormville, NY (US);

Shom Ponoth, Guilderland, NY (US);

Michael Beck, Dressen, DE;

Inventors:

John A. Fitzsimmons, Poughkeepsie, NY (US);

David L. Rath, Stormville, NY (US);

Shom Ponoth, Guilderland, NY (US);

Michael Beck, Dressen, DE;

Assignees:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01B 13/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A composition that may be used for cleaning a metal containing conductor layer, such as a copper containing conductor layer, within a microelectronic structure includes an aqueous acid, along with an oxidant material and a passivant material contained within the aqueous acid. The composition does not include an abrasive material. The composition is particularly useful for cleaning a residue from a copper containing conductor layer and an adjoining dielectric layer that provides an aperture for accessing the copper containing conductor layer within a microelectronic structure.


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