The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2010
Filed:
Mar. 17, 2006
Takenobu Kobayashi, Utsunomiya, JP;
Takenobu Kobayashi, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus, and exposure method and a device manufacturing method, wherein the exposure apparatus includes a projection optical system, an original stage configured to hold an original thereon and to move the original, a position measuring system configured to measure a position of a pattern surface of the original held by the original stage, with respect to a direction parallel to an optical axis of the projection optical system, an exposure system configured to expose a substrate through the original and the projection optical system, on the basis of the measurement by the position measuring system, a memory configured to store therein compensation information that interrelates a temperature of the position measuring system and a compensation quantity for compensating for an output of the position measuring system, and a controller configured to compensate for an output of the position measuring system on the basis of the compensation information stored in the memory, to obtain a position measured value for the pattern surface.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile