The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 09, 2010

Filed:

Jan. 05, 2007
Applicants:

Christoph Schwan, Gebhardsbain, DE;

Manfred Horstmann, Duerrrhoehrsdorf-Ditterbach, DE;

Martin Gerhardt, Dresden, DE;

Markus Forseberg, Dresden, DE;

Inventors:

Christoph Schwan, Gebhardsbain, DE;

Manfred Horstmann, Duerrrhoehrsdorf-Ditterbach, DE;

Martin Gerhardt, Dresden, DE;

Markus Forseberg, Dresden, DE;

Assignee:

GlobalFoundries, Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/762 (2006.01);
U.S. Cl.
CPC ...
Abstract

By recessing the isolation structure of a transistor prior to silicidation, the series resistance may be reduced due to the increased amount of metal silicide formed in the vicinity of the isolation structure. By recessing the isolation structure prior to the formation of the gate electrode, an increased degree of poly wrap around may be obtained, thereby increasing the effective channel width.


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