The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2010
Filed:
Mar. 01, 2006
Peter Dirksen, Leuven, BE;
Casparus Anthonius Henricus Juffermans, Leuven, BE;
Johannes Van Wingerden, Leuven, BE;
Peter Dirksen, Leuven, BE;
Casparus Anthonius Henricus Juffermans, Leuven, BE;
Johannes Van Wingerden, Leuven, BE;
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Abstract
For lithographically manufacturing a device with a very high density, a design mask pattern () is distributed on a number of sub-patterns () by means of a new method. The sub-patterns do not comprise 'forbidden' structures () and can be transferred by conventional apparatus to a substrate layer to be patterned. For the transfer, a new stack of layers is used, which comprise a pair of a processing layer () and an inorganic anti-reflection layer () for each sub-pattern. After a first processing layer () has been patterned with a first sub-pattern, it is coated with a new resist layer () which is exposed with a second sub-pattern, and a second processing layer () under the first processing layer is processed with the second sub-pattern.