The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2010
Filed:
Nov. 20, 2006
Aihua Chen, Shanghai, CN;
Shulin Wang, Campbell, CA (US);
Henry Ho, San Jose, CA (US);
Gerald Yin, Shanghai, CN;
Qing LV, Shanghai, CN;
LI Fu, San Francisco, CA (US);
AiHua Chen, Shanghai, CN;
Shulin Wang, Campbell, CA (US);
Henry Ho, San Jose, CA (US);
Gerald Yin, Shanghai, CN;
Qing Lv, Shanghai, CN;
Li Fu, San Francisco, CA (US);
Advanced Micro-Fabrication Equipment, Inc. Asia, Georgetown, Grand Cayman, KY;
Abstract
A semiconductor work piece processing reactor is described and which includes a processing chamber defining a deposition region; a pedestal which supports and moves a semiconductor work piece to be processed within the deposition region of the processing chamber; and a gas distribution assembly mounted within the processing chamber and which defines first and second reactive gas passageways which are separated from each other, and which deliver two reactant gases to a semiconductor work piece which is positioned near the gas distribution assembly.