The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2010
Filed:
Mar. 31, 2006
Joseph Daniel Tobiason, Woodinville, WA (US);
Yuhua Ding, Bothell, WA (US);
Joseph Daniel Tobiason, Woodinville, WA (US);
Yuhua Ding, Bothell, WA (US);
Mitutoyo Corporation, Kawasaki-shi, JP;
Abstract
A method characterizes field of view (FOV) distortion and may correct machine vision measurements accordingly. A plurality of distorted images are acquired, with the same calibration target at a plurality of spaced-apart locations within the FOV. The method analyzes the images and determines distortion parameters that can correct the distortions in the images such that features included in the calibration target pattern achieve a sufficient or optimum degree of congruence between the various images. Distortion parameters may be determined for each optical configuration (e.g., lens combination, magnification, etc.) that is used by a machine vision inspection system. The distortion parameters may then be used to correct FOV distortion errors in subsequent inspection and measurement operations.