The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2010

Filed:

Nov. 09, 2004
Applicants:

Hiroshi Daimon, Ikoma, JP;

Hiroyuki Matsuda, Aioi, JP;

Makoto Kato, Akishima, JP;

Masato Kudo, Akishima, JP;

Inventors:

Hiroshi Daimon, Ikoma, JP;

Hiroyuki Matsuda, Aioi, JP;

Makoto Kato, Akishima, JP;

Masato Kudo, Akishima, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 1/08 (2006.01); H01J 3/14 (2006.01); H01J 3/26 (2006.01); H01J 49/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

A mesh (M) having an ellipsoid shape or a shape close to the ellipsoid shape is attached to an electrode (EL) among electrodes (ELto ELn). Voltages of the later-stage electrodes (ELto ELn) are appropriately set. With this arrangement, a local negative spherical aberration generated by the mesh (M) is cancelled out with a positive spherical aberration. This optimizes an electric field distribution. As a result, this realizes an electrostatic lens whose acceptance angle is extended to about ±60°.


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