The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2010
Filed:
Oct. 26, 2006
Mark Naoshi Kawaguchi, Sunnyvale, CA (US);
Kin Pong Lo, Fremont, CA (US);
Brett Christian Hoogensen, Los Gatos, CA (US);
Sandy M. Wen, San Jose, CA (US);
Steven M. Kim, Union City, CA (US);
Mark Naoshi Kawaguchi, Sunnyvale, CA (US);
Kin Pong Lo, Fremont, CA (US);
Brett Christian Hoogensen, Los Gatos, CA (US);
Sandy M. Wen, San Jose, CA (US);
Steven M. Kim, Union City, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for removing volatile residues from a substrate are provided. In one embodiment, a method for volatile residues from a substrate includes providing a processing system having a load lock chamber and at least one processing chamber coupled to a transfer chamber, treating a substrate in the processing chamber with a chemistry comprising halogen, and removing volatile residues from the treated substrate in the load lock chamber.