The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7655057 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 02, 2010

Filed:

Aug. 30, 2006
Applicant:

Eiichi Yamada, Kani, JP;

Inventor:

Eiichi Yamada, Kani, JP;

Assignee:

Fujimi Incorporated, Kiyosu-shi, Aichi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K 3/14 (2006.01); B24D 3/02 (2006.01); C09C 1/68 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polishing composition contains a compound represented by the general formula (1) below and abrasive grains. In the general formula (1), X represents a residue of polyether polyol (having a polyether chain containing an oxyethylene group in an amount of 20 to 90% by mass) derived from a compound having an active hydrogen atom and an alkylene oxide; m represents an integer of 2 to 8, which is equal to the number of hydroxy groups contained in a single polyether polyol molecule; Y and Z represent a lower alcohol residue to which ethylene oxide or propylene oxide is added by addition polymerization, an alkyl group or an alkylene group, respectively; and n is an integer of 3 or more.


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Yamada, Eiichi. (2010). Polishing composition and polishing method (U.S. Patent No. 7655057). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7655057

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