The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2010
Filed:
Jan. 12, 2006
Joseph M. Jacobson, Newton, MA (US);
Jae-bum Joo, Cambridge, MA (US);
Jon Varsanik, Allston, MA (US);
Vikrant Agnihotri, Jersey City, NJ (US);
Joseph M. Jacobson, Newton, MA (US);
Jae-bum Joo, Cambridge, MA (US);
Jon Varsanik, Allston, MA (US);
Vikrant Agnihotri, Jersey City, NJ (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
A process for forming nanostructures comprises generating charged nanoparticles with an electrospray system in a vacuum chamber and introduction of the charged nanoparticles to a region proximate to a charge pattern, so that the particles adhere to the charge pattern in order to form the feature. Two- or three-dimensional nanostructures may be formed by rapidly creating a charge pattern of nanoscale dimensions on a substrate using a normal electron beam or a microcolumn electron beam, generating high purity nanoscale or molecular size scale building blocks of a first type that image the charge pattern using the electrospray system, and then optionally sintering the building blocks to form the feature.