The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2010
Filed:
Jul. 07, 2008
Applicant:
Vladimir Kuznetsov, Utrecht, NL;
Inventor:
Vladimir Kuznetsov, Utrecht, NL;
Assignee:
ASM International N.V., Bilthoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); G01R 31/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed is a method involving repeatedly measuring a pressure within a flow of processing gas that is provided in a semiconductor processing apparatus for treatment of a semiconductor substrate, such as a semiconductor wafer. The flow of processing gas is made to extend between a surface of the substrate and a surface of a processing body. From the pressure measurements the occurrence of an event that is related to a variation in the position of the substrate's surface relative to the surface of the processing body is determined.