The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7651825 B1

PDF
Full Text
Expired
Date of Patent:
Jan. 26, 2010

Filed:

Mar. 01, 2006
Applicant:

Franciscus Bernardus Maria Van Bilsen, Eindhoven, NL;

Inventor:
Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 5/00 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method are provided for determining an overlay of a first layer N-and a second layer N that are positioned one over the other on a substrate. The first layer includes a first overlay portion. The second layer includes a first complementary overlay portion. The first overlay portion and first complementary overlay portion are arranged to form an overlay mark for determining the overlay of the first and second layers. In the second layer a stitching portion and a complementary stitching portion are formed. The stitching portion and complementary stitching portion are arranged to form a stitching mark for determining a stitching overlay between the second layer and an adjacent second layer, with the adjacent second layer being positioned adjacent to the second layer.


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Van Bilsen, Franciscus Bernardus Maria. (2010). Method and system for overlay control using dual metrology sampling (U.S. Patent No. 7651825). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7651825

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