The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2010
Filed:
May. 25, 2006
Christianus Gerardus Maria DE Mol, Son en Breugel, NL;
Christianus Gerardus Maria De Mol, Son en Breugel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A system in which deformation of a substrate is monitored during processing of the substrate is described. In one embodiment, the distortion in the substrate is measured after each exposure and processing operation by comparing the position of a plurality of reference marks to values in a database. The substrate may be characterized by measuring positions on the substrate for a number of measurement fields and a number of measurement positions per field, calculating an estimated variance based at least on the number of measurement fields, the number of measurement positions per field, and a number of model parameters, and comparing the calculated estimated variance to a threshold amount to determine a status of the substrate.