The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2010
Filed:
Jun. 22, 2007
Shahin Zangooie, Hopewell Junction, NY (US);
Roger M. Young, Warwick, NY (US);
Lin Zhou, LaGrangeville, NY (US);
Clemente Bottini, Marlboro, NY (US);
Ronald D. Fiege, Hopewell Junction, NY (US);
Shahin Zangooie, Hopewell Junction, NY (US);
Roger M. Young, Warwick, NY (US);
Lin Zhou, LaGrangeville, NY (US);
Clemente Bottini, Marlboro, NY (US);
Ronald D. Fiege, Hopewell Junction, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method, system and computer program product for determining an Azimuth angle of an incident beam to a wafer are disclosed. A method comprises: using the incident beam to make a first set of measurements of calibration targets of a first set of grating angles that are different than one another; analyzing the first set of measurements to determine an reference grating angle which corresponds to a grating line to which the incident beam has a practically zero Azimuth angle; and determining the Azimuth angle of the incident beam to the wafer using the determined reference grating angle.