The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 2010

Filed:

Apr. 23, 2008
Applicants:

Kazufumi Nishida, Musashino, JP;

Shigeyuki Kakuta, Musashino, JP;

Inventors:

Kazufumi Nishida, Musashino, JP;

Shigeyuki Kakuta, Musashino, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02 (2006.01); G01J 3/45 (2006.01); G01B 11/02 (2006.01); G01B 11/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A film thickness measuring apparatus of the present invention includes: a light source that emits white light to be irradiated onto a multilayer thin film; a spectroscope that disperses reflected light obtained as a result of irradiating the white light onto the multilayer thin film in order to obtain reflectance spectrums; and a computation section, said computation section including: a setting section that sets a plurality of wavelength ranges for the reflectance spectrums; a first conversion section that obtains wavenumber range reflectance spectrums by re-sequencing, among the reflectance spectrums, reflectance spectrums in the plurality of wavelength ranges set in said setting section at equal intervals, respectively; a second conversion section that converts the wavenumber range reflectance spectrums in the plurality of wavelength ranges obtained in said first conversion section into power spectrums, respectively; and a calculation section that obtains a film thickness of the multilayer thin film based on the power spectrums.


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