The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2010

Filed:

Aug. 08, 2006
Applicants:

Irwan Dani Setija, Utrecht, NL;

Arie Jeffrey Den Boef, Waalre, NL;

Inventors:

Irwan Dani Setija, Utrecht, NL;

Arie Jeffrey Den Boef, Waalre, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G01B 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

Reconstruction of an object by which radiation is diffracted is disclosed. Specifically, the reconstruction includes: estimating the object shape; deriving a model diffraction pattern from the estimated shape; illuminating the object with radiation; detecting a diffraction pattern of radiation diffracted by the object; comparing the model diffraction pattern and the detected diffraction pattern; and determining the actual object shape from the difference between the model diffraction pattern and the detected diffraction pattern, wherein the model diffraction pattern is determined using Bloch Mode Expansion.


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