The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2010
Filed:
Sep. 30, 2005
Stefano Parascandola, Dresden, DE;
Roman Knoefler, Fishkill, NY (US);
Stephan Riedel, Dresden, DE;
Dominik Olligs, Dresden, DE;
Torsten Mueller, Dresden, DE;
Dirk Caspary, Dresden, DE;
Stefano Parascandola, Dresden, DE;
Roman Knoefler, Fishkill, NY (US);
Stephan Riedel, Dresden, DE;
Dominik Olligs, Dresden, DE;
Torsten Mueller, Dresden, DE;
Dirk Caspary, Dresden, DE;
Infineon Technologies AG, Munich, DE;
Abstract
The bit lines are produced by an implantation of a dopant by means of a sacrificial hard mask layer, which is later replaced with the gate electrodes formed of polysilicon in the memory cell array. Striplike areas of the memory cell array, which run transversely to the bit lines, are reserved by a blocking layer to be occupied by the bit line contacts. In these areas, the hard mask is used to form contact holes, which are self-aligned with the implanted buried bit lines. Between the blocked areas, the word lines are arranged normally to the bit lines.