The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2010
Filed:
Jun. 23, 2006
Kazuyoshi Irie, Hitachi, JP;
Toshihiro Mori, Tokai-mura, JP;
Hisao Yokoyama, Hitachioota, JP;
Takayuki Tomiyama, Hitachi, JP;
Toshihide Takano, Tomobe-machi, JP;
Shin Tamata, Ooarai-machi, JP;
Shuichi Kanno, Hitachi, JP;
Kazuyoshi Irie, Hitachi, JP;
Toshihiro Mori, Tokai-mura, JP;
Hisao Yokoyama, Hitachioota, JP;
Takayuki Tomiyama, Hitachi, JP;
Toshihide Takano, Tomobe-machi, JP;
Shin Tamata, Ooarai-machi, JP;
Shuichi Kanno, Hitachi, JP;
Hitachi, Ltd., Tokyo, JP;
Hitachi Engineering Co., Ltd., Ibaraki, JP;
Hitachi Kyowa Engineering Co., Ltd., Ibaraki, JP;
Abstract
An exhaust gas containing a perfluoride component (PFC) and SiIFis conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CFis heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and COat a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.