The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2009
Filed:
Aug. 23, 2006
Kyle S. Lebouitz, Pittsburgh, PA (US);
David L. Springer, Pittsburgh, PA (US);
Kyle S. Lebouitz, Pittsburgh, PA (US);
David L. Springer, Pittsburgh, PA (US);
Xactix, Inc., Pittsburgh, PA (US);
Abstract
In an apparatus and method of vapor etching, a sample (S) to be etched is located in a main chamber () from which the atmosphere inside is evacuated. Etching gas is input into the main chamber () for a first period of time. Thereafter, the etching gas is evacuated from the main chamber () and cooling/purging gas is input into the main chamber for a second interval of time. Thereafter, the cooling/purging gas is evacuated from the main chamber (). Desirably, the steps of inputting the etching gas into the main chamber () for the first period of time, evacuating the etching gas from the main chamber, inputting the cooling/purging gas into the main chamber () for the second period of time, and evacuating the cooling/purging gas from the main chamber are repeated until samples have been etched to a desired extent.