The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2009

Filed:

Feb. 26, 2007
Applicants:

Keith Heinemann, Mesa, AZ (US);

Jamin Ling, Scottsdale, AZ (US);

Richard Mccullough, Chandler, AZ (US);

Brian Mchugh, Phoenix, AZ (US);

Jordan Lane Wahl, Mesa, AZ (US);

Inventors:

Keith Heinemann, Mesa, AZ (US);

Jamin Ling, Scottsdale, AZ (US);

Richard McCullough, Chandler, AZ (US);

Brian McHugh, Phoenix, AZ (US);

Jordan Lane Wahl, Mesa, AZ (US);

Assignee:

SV Probe Pte. Ltd., Singapore, SG;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01R 43/16 (2006.01);
U.S. Cl.
CPC ...
Abstract

An approach is provided for fabricating probe elements for probe card assemblies. Embodiments of the invention include using a reusable substrate, a reusable substrate with layered probe elements and a reusable substrate with a passive layer made of a material that does not adhere well to probe elements formed thereon. Examples of probe elements include, without limitation, a cantilever probe element, a vertically-oriented probe element, and portions of probe elements, e.g., a beam element of a cantilever probe element. Probe elements, or portions of probe elements, may be formed using any of a number of electroforming or plating processes such as, for example, plating using masking techniques, e.g., using lithographic techniques such as photolithography, stereolithography, X-ray lithography, etc.


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