The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 22, 2009

Filed:

Jun. 04, 2003
Applicant:

Fumio Sakiya, Kannabe-cho, JP;

Inventor:

Fumio Sakiya, Kannabe-cho, JP;

Assignee:

Rorze Corporation, Hiroshima, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
Abstract

When a first floor () which is formed of a punching plate or the like and through which air passes is provided immediately below an arm () at a middle height part of a conveying robot () in a casing () of a clean transfer device () and a degree of opening of a casing bottom part frame (), which supports a base part of the conveying robot (), with respect to the outside is restricted, a class 1 can be maintained. Here, when a second floor () formed of a punching plate or the like is used on the casing bottom part frame (), a class 0 state can be realized under specific conditions, thereby enabling production of a semiconductor having a wire width of 0.1 μm. As a result, the device can cope with the unexpectedly high degree of cleanliness of 0.1 μm particle class 1, which cannot be realized in the prior art, requested also for the transfer device according to a reduction in wire width on a highly integrated semiconductor wafer.


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