The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2009
Filed:
Nov. 03, 2004
Rene Monshouwer, Leiden, NL;
Rene Monshouwer, Leiden, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The invention relates to a method for measuring the relative position of a first and a second alignment mark on a substrate. The first alignment mark comprises a periodic structure having a first portion with a first periodicity (PE) and an adjacent second portion with a second periodicity (PE). The second alignment mark () comprises a periodic structure having a first portion with the second periodicity (PE) and an adjacent second portion with the first periodicity (PE). The first and second alignment marks are arranged such that the first portions are substantially located one over the other and the second portions are substantially located one over the other. The method further comprises generating a Moiré pattern from the alignment marks and determining the relative positions of the first and second alignment marks based on the periodicity of the Moiré pattern.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile