The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2009
Filed:
Jul. 24, 2006
Hans Butler, Best, NL;
Jan-gerard Cornelis Van Der Toorn, Eindhoven, NL;
Martijn Houkes, Sittard, NL;
Wilhelmus Franciscus Johannes Simons, Beesel, NL;
Hans Butler, Best, NL;
Jan-Gerard Cornelis Van Der Toorn, Eindhoven, NL;
Martijn Houkes, Sittard, NL;
Wilhelmus Franciscus Johannes Simons, Beesel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A control system to control a position parameter of a stage in a lithographic apparatus includes a stage controller to control a position parameter of the stage in at least a first direction. The control system includes a disturbance torque estimator to estimate a disturbance torque on the stage, the disturbance torque about an axis extending in a second direction, the second direction being substantially perpendicular to the first direction. The control system includes a correction signal calculator, the correction signal calculator provided with the estimated disturbance torque and a signal representative of a position of the stage in a third direction, the third direction being substantially perpendicular to the first and second directions. The correction signal calculator determines a feedforward correction signal to correct a position error of the stage in the first direction due to the disturbance torque, the feedforward correction signal to be fed to the stage.