The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2009
Filed:
Dec. 29, 2004
Masahito Onda, Gunma, JP;
Hirotoshi Kubo, Gunma, JP;
Shouji Miyahara, Gunma, JP;
Hiroyasu Ishida, Gunma, JP;
Hiroaki Saito, Gunma, JP;
Masahito Onda, Gunma, JP;
Hirotoshi Kubo, Gunma, JP;
Shouji Miyahara, Gunma, JP;
Hiroyasu Ishida, Gunma, JP;
Hiroaki Saito, Gunma, JP;
Sanyo Electric Co., Ltd., Moriguchi-shi, JP;
Abstract
An interlayer dielectric film is completely buried in a trench, and failures caused by step coverage is prevented because a source electrode can be formed substantially uniformly on an upper portion of a gate electrode. Also, in the processes of forming a source region, a body region and an interlayer dielectric film, only one mask is necessary so that the device size is reduced to account for placement error of only one mask alignment.