The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2009
Filed:
Nov. 23, 2005
Ashok Bhatnagar, Richmond, VA (US);
Lori L. Wagner, Richmond, VA (US);
Chok Bin C. Tan, Richmond, VA (US);
Brian Arvidson, Chester, VA (US);
Harold Lindley Murray, Jr., North East, MD (US);
David Hurst, Richmond, VA (US);
Ashok Bhatnagar, Richmond, VA (US);
Lori L. Wagner, Richmond, VA (US);
Chok Bin C. Tan, Richmond, VA (US);
Brian Arvidson, Chester, VA (US);
Harold Lindley Murray, Jr., North East, MD (US);
David Hurst, Richmond, VA (US);
Honeywell International Inc., Morristown, NJ (US);
Abstract
Fabric laminates having superior resistance to penetration of fragments, such as shrapnel. The fabrics are formed of high-strength fibers consolidated with from about 7% to about 15% by weight of an elastomeric matrix composition, and in combination with protective layers of a polymer film on each surface of the fabric. The fabrics achieve a significant improvement in fragment resistance compared to fabrics of the prior art, while also maintaining excellent ballistic resistant properties.