The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2009
Filed:
Aug. 03, 2004
Soovo Sen, Sunnyvale, CA (US);
Inna Shmurun, Foster City, CA (US);
Thomas Nowak, Cupertino, CA (US);
Nancy Fung, Sunnyvale, CA (US);
Brian Hopper, Campbell, CA (US);
Andrzej Kaszuba, San Jose, CA (US);
Eller Juco, San Jose, CA (US);
Soovo Sen, Sunnyvale, CA (US);
Inna Shmurun, Foster City, CA (US);
Thomas Nowak, Cupertino, CA (US);
Nancy Fung, Sunnyvale, CA (US);
Brian Hopper, Campbell, CA (US);
Andrzej Kaszuba, San Jose, CA (US);
Eller Juco, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for a chamber for chemical vapor deposition on a substrate in a processing region comprising a gas box having a heated lid comprising a gas inlet passage, and a face plate connected to the heated lid positioned to conduct gas from the heated gas box to a substrate processing region. Also, a method for providing heat to a chemical vapor deposition chamber comprising supplying heat to a lid of a gas box, and heating a face plate connected to the gas box by heat transfer from the lid.