The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7623247 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 24, 2009

Filed:

May. 04, 2006
Applicant:

Kazuki Yamamoto, Utsunomiya, JP;

Inventor:

Kazuki Yamamoto, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A measuring device for measuring a wavefront aberration of an optical system includes a first mask for defining light that enters the optical system, and a second mask having first to fourth openings. The first opening transmits a component of the light passing through the optical system without removing information about the wavefront aberration of the optical system, and the second to fourth openings transmit components of the light passing through the optical system having the information about the wavefront aberration of the optical system removed.


Find Patent Forward Citations

Yamamoto, Kazuki. (2009). Wavefront-aberration measuring device and exposure apparatus including the device (U.S. Patent No. 7623247). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7623247

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