The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2009
Filed:
Dec. 23, 2005
Hiroto Ohtake, Tokyo, JP;
Masayoshi Tagami, Tokyo, JP;
Munehiro Tada, Tokyo, JP;
Yoshihiro Hayashi, Tokyo, JP;
Hiroto Ohtake, Tokyo, JP;
Masayoshi Tagami, Tokyo, JP;
Munehiro Tada, Tokyo, JP;
Yoshihiro Hayashi, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A semiconductor device includes a first interconnection layer and a interlayer insulating layer. The first interconnection layer is formed on a upper side of a substrate, and includes a first interconnection. The interlayer insulating layer is formed on the first interconnection layer, and includes a via connected with the first interconnection at one end of the via and a second interconnection connected with the via at another end of the via. The interlayer insulating layer has a relative dielectric constant lower than that of a silicon oxide film. An upper portion of the interlayer insulating layer includes a silicon-oxide film, a silicon nitride film and a silicon oxide film in order from a lower portion.