The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2009
Filed:
Apr. 20, 2006
Erika Lee Mcfadden, Dallas, TX (US);
Ronald Charles Roth, McKinney, TX (US);
Lisa Ann Wesneski, The Colony, TX (US);
Erika Lee McFadden, Dallas, TX (US);
Ronald Charles Roth, McKinney, TX (US);
Lisa Ann Wesneski, The Colony, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
Method for removing contaminants from a surface during semiconductor fabrication. A preferred embodiment comprises developing a resist layer on a top surface of a semiconductor substrate, curing the developed resist layer, and cleaning the developed resist layer with a developer solution to remove contaminants. The cleaning makes use of the same developer solution used to develop the resist layer, so the cleaning makes use of a process that already exists and requires no additional investment to implement, while the curing stabilizes the developed resist layer so that the cleaning does not damage the developed resist layer.