The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2009
Filed:
Feb. 25, 2005
Applicants:
Torbjorn Sandstrom, Pixbo, SE;
Hans Martinsson, Goteburg, SE;
Inventors:
Torbjorn Sandstrom, Pixbo, SE;
Hans Martinsson, Goteburg, SE;
Assignee:
Micronic Laser Systems AB, Taby, SE;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J 2/47 (2006.01); G02B 26/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention relates to Optical Maskless Lithography (OML). In particular, it relates to providing OML with a recognizable relationship to mask and phase-shift mask techniques.
Sandstrom, Torbjorn. (2009). Ret for optical maskless lithography (U.S. Patent No. 7618751). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7618751
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile