The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2009
Filed:
Apr. 24, 2007
Wuping Liu, Singapore, SG;
Michael Beck, San Jose, CA (US);
John A. Fitzsimmons, Poughkeepsie, NY (US);
Wuping Liu, Singapore, SG;
Michael Beck, San Jose, CA (US);
John A. Fitzsimmons, Poughkeepsie, NY (US);
Chartered Semiconductor Manufacturing Ltd., Singapore, SG;
Infineon Technologies North America Corp., Milpitas, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An integrated circuit hard mask processing system is provided including providing a substrate having an integrated circuit; forming an interconnect layer over the integrated circuit; applying a low-K dielectric layer over the interconnect layer; applying a hard mask layer over the low-K dielectric layer; forming a via opening through the hard mask layer and the low-K dielectric layer to the interconnect layer; applying a first fluid and a second fluid in the via opening for removing an overhang of the hard mask layer; depositing an interconnect metal in the via opening; and chemical-mechanical polishing the interconnect metal and the ultra low-K dielectric layer.