The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2009

Filed:

Aug. 15, 2006
Applicants:

Joe R. Trogolo, Plano, TX (US);

Hiroshi Yasuda, Dallas, TX (US);

Badih El-kareh, Cedar Park, TX (US);

Philipp Steinmann, Richardson, TX (US);

Inventors:

Joe R. Trogolo, Plano, TX (US);

Hiroshi Yasuda, Dallas, TX (US);

Badih El-Kareh, Cedar Park, TX (US);

Philipp Steinmann, Richardson, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/337 (2006.01);
U.S. Cl.
CPC ...
Abstract

The disclosure herein pertains to fashioning an n channel junction field effect transistor (NJFET) and/or a p channel junction field effect transistor (PJFET) with an open drain, where the open drain allows the transistors to operate at higher voltages before experiencing gate leakage current. The open drain allows the voltage to be increased several fold without increasing the size of the transistors. Opening the drain essentially spreads equipotential lines of respective electric fields developed at the drains of the devices so that the local electric fields, and hence the impact ionization rates are reduced to redirect current below the surface of the transistors.


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