The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2009

Filed:

Mar. 26, 2007
Applicants:

Sou Kamimura, Shizouka, JP;

Tomoya Sasaki, Shizuoka, JP;

Yasutomo Kawanishi, Shizuoka, JP;

Kenji Wada, Shizuoka, JP;

Inventors:

Sou Kamimura, Shizouka, JP;

Tomoya Sasaki, Shizuoka, JP;

Yasutomo Kawanishi, Shizuoka, JP;

Kenji Wada, Shizuoka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A positive resist composition containing a compound including a sulfonium cation having a structure represented by the formula (Z-I) as defined herein, a low molecular weight compound which increases solubility in an alkali developing solution by an action of an acid, and a compound which generates a compound having a structure represented by the formula (A-I) as defined herein upon irradiation of an actinic ray or a radiation.


Find Patent Forward Citations

Kamimura, Sou. (2009). Positive resist composition and pattern formation method using the same (U.S. Patent No. 7615330). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7615330

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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